RMPECVD of silica films in large scale microwave plasma reactor : Films properties F. Naudin, P. Tristant, M. C. Hugon, I. Jauberteau, B. Agius et J. DesmaisonJ. Phys. IV France, 09 PR8 (1999) Pr8-819-Pr8-826DOI: https://doi.org/10.1051/jp4:19998104
