Electrical properties of ferroelectric SrBi2Ta2O9 thin films deposited on MOCVD-Pt/SiO2/Si substrates by plasma-enhanced metalorganic chemical vapor deposition
J. Phys. IV France, 08 PR9 (1998) Pr9-255-Pr9-260
DOI: https://doi.org/10.1051/jp4:1998950