Magnetic properties of silicon-iron laminations Si-enriched by a SiH4 based CVD process S. Audisio, H. Idrissi, F. Khomamizadeh, J. Degauque, C. Appino, E. Ferrara, F. Fiorillo, L. Rocchino, I. Suberbielle et M. BariccoJ. Phys. IV France, 08 PR2 (1998) Pr2-535-Pr2-538DOI: https://doi.org/10.1051/jp4:19982124
