Stability and formation kinetics of TiN and silicides in the Ti/Si3N4 diffusion couple M. PAULASTO, F. J.J. VAN LOO et J. K. KIVILAHTIJ. Phys. IV France, 03 C7 (1993) C7-1069-C7-1072DOI: https://doi.org/10.1051/jp4:19937167
