A comparative study of O2/SiH4 and N2O/SiH4 mixtures for SiO2 deposition in a microwave afterglow H. DEL PUPPO, J. DESMAISON et L. PECCOUDJ. Phys. IV France, 03 C3 (1993) C3-241-C3-246DOI: https://doi.org/10.1051/jp4:1993332
