Elaboration of in situ phosphorus doped polysilicon films under LPCVD conditions : process modelling and characterization A. TOUNSI, E. SCHEID, C. AZZARO, P. DUVERNEUIL et J. P. COUDERCJ. Phys. IV France, 03 C3 (1993) C3-123-C3-130DOI: https://doi.org/10.1051/jp4:1993315
