LOW-TEMPERATURE CHEMICAL-VAPOR-DEPOSITION OF SILICON NITRIDE H. KANOH, O. SUGIURA, S. FUJIOKA, Y. ARAMAKI, T. HATTORI et M. MATSUMURAJ. Phys. IV France, 02 C2 (1991) C2-831-C2-837DOI: https://doi.org/10.1051/jp4:1991298
