UHV CHEMICAL VAPOUR DEPOSITION OF UNDOPED AND IN-SITU DOPED POLYSILICON FILMS W. AHMED, R. D. PILKINGTON et D. B. MEAKINJ. Phys. IV France, 02 C2 (1991) C2-809-C2-816DOI: https://doi.org/10.1051/jp4:1991295
