DEPOSITION OF BORON NITRIDE BY PLASMA ENHANCED CVD USING BORANE AMINE J. G.M. BECHT, A. BATH, E. HENGST, P.J. VAN DER PUT et J. SCHOONMANJ. Phys. IV France, 02 C2 (1991) C2-617-C2-624DOI: https://doi.org/10.1051/jp4:1991274
