INFLUENCE OF ETCHING THE TiC UNDERLAYER WITH CH4/AlCl3/H2 ON THE CVD FORMATION OF KAPPA-Al2O3 M. DANZINGER, R. HAUBNER et B. LUXJ. Phys. IV France, 02 C2 (1991) C2-579-C2-586DOI: https://doi.org/10.1051/jp4:1991269
