INFLUENCE OF CH4 AND Ar ON THE MORPHOLOGIES OF Al2O3 - CVD COATINGS M. DANZINGER, J. PENG, R. HAUBNER et B. LUXJ. Phys. IV France, 02 C2 (1991) C2-571-C2-578DOI: https://doi.org/10.1051/jp4:1991268
