SURFACE MECHANISMS IN THE UVCVD OF SiO2 FILMS C. LICOPPE, C. MERIADEC, J. FLICSTEIN, Y. I. NISSIM, E. PETIT et J. M. MOISONJ. Phys. IV France, 02 C2 (1991) C2-357-C2-364DOI: https://doi.org/10.1051/jp4:1991243
