METALORGANIC CHEMICAL VAPOR DEPOSITION : EXAMPLES OF THE INFLUENCE OF PRECURSOR STRUCTURE ON FILM PROPERTIES K. F. JENSEN, A. ANNAPRAGADA, K. L. HO, J.-S. HUH, S. PATNAIK et S. SALIMJ. Phys. IV France, 02 C2 (1991) C2-243-C2-252DOI: https://doi.org/10.1051/jp4:1991230
