THE REACTIVITY AND MOLECULAR SIZE OF FILM PRECURSORS DURING CHEMICAL VAPOR DEPOSITION OF WSix Y. SHIMOGAKI, T. SAITO, F. TADOKORO et H. KOMIYAMAJ. Phys. IV France, 02 C2 (1991) C2-95-C2-102DOI: https://doi.org/10.1051/jp4:1991211
