PROCESSING OF WSi2 FILMS BY LOW PRESSURE CHEMICAL VAPOR DEPOSITION FROM IN SITU CHLORINATION OF METAL E. BLANQUET, N. THOMAS, P. SURYANARAYANA, C. VAHLAS, C. BERNARD et R. MADARJ. Phys. IV France, 02 C2 (1991) C2-873-C2-880DOI: https://doi.org/10.1051/jp4:19912104
