CVD CARBONYL THIN FILMS OF TUNGSTEN AND MOLYBDENUM AND THEIR SILICIDES - A GOOD ALTERNATIVE TO CVD FLUORIDE TUNGSTEN TECHNOLOGY K. A. GESHEVA, V. ABROSIMOVA et G. D. BESHKOVJ. Phys. IV France, 02 C2 (1991) C2-865-C2-871DOI: https://doi.org/10.1051/jp4:19912103
