SILICON DEPOSITION FROM DISILANE : EXPERIMENTAL STUDY AND MODELLING M. GUEYE, E. SCHEID, P. TAURINES, P. DUVERNEUIL, D. BIELLE-DASPET et J. P. COUDERCJ. Phys. IV France, 02 C2 (1991) C2-63-C2-70DOI: https://doi.org/10.1051/jp4:1991207
