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Kinetics of Chemical Vapour Deposition of Boron Nitride from a Gas Mixture of Trimethylborazine, Ammonia, and Hydrogen at 900 to 1050 °C and 1 Bar Total Pressure

A. Jörg, D. Neuschütz, E. Zimmermann

J. Phys. IV France, 05 C5 (1995) C5-167-C5-174

DOI: https://doi.org/10.1051/jphyscol:1995518

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Citations de cet article :

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Scripta Materialia 55 (3) 219 (2006)
https://doi.org/10.1016/j.scriptamat.2006.04.011