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Cited article:

Morphology and Thermal Stability of Me-Si-N (Me=Re, W, Ta) for Microelectronics

A.-M. Dutron, E. Blanquet, V. Ghetta, R. Madar, C. Bernard

J. Phys. IV France, 05 C5 (1995) C5-1141-C5-1148

DOI: https://doi.org/10.1051/jphyscol:19955135

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