Article cité par

La fonctionnalité Article cité par… liste les citations d'un article. Ces citations proviennent de la base de données des articles de EDP Sciences, ainsi que des bases de données d'autres éditeurs participant au programme CrossRef Cited-by Linking Program. Vous pouvez définir une alerte courriel pour être prévenu de la parution d'un nouvel article citant " cet article (voir sur la page du résumé de l'article le menu à droite).

Article cité :

Kinetic Processes in the CVD of SiC from CH₃SiCl₃-H₂ in a Vertical Hot-Wall Reactor

F. Langlais, F. Loumagne, D. Lespiaux, S. Schamm, R. Naslain

J. Phys. IV France, 05 C5 (1995) C5-105-C5-112

DOI: https://doi.org/10.1051/jphyscol:1995510

PDF (1.181 MB)

Citations de cet article :

Porous Membranes as Sacrificial Layers Enabling Conformal Chemical Vapor Deposition Involving Multiple Film-Forming Species

Kohei Shima, Yuichi Funato, Noboru Sato, et al.
ACS Applied Materials & Interfaces 12 (45) 51016 (2020)
https://doi.org/10.1021/acsami.0c14069

Identification of Film-Forming Species during SiC-CVD of CH3SiCl3/H2 by Exploiting Deep Microtrenches

Kohei Shima, Noboru Sato, Yuichi Funato, et al.
ECS Journal of Solid State Science and Technology 8 (8) P423 (2019)
https://doi.org/10.1149/2.0191908jss

Hydrothermal Corrosion Behaviors of Constituent Materials of SiC/SiC Composites for LWR Applications

Shoko Suyama, Masaru Ukai, Megumi Akimoto, Toshiki Nishimura and Satoko Tajima
Ceramics 2 (4) 602 (2019)
https://doi.org/10.3390/ceramics2040047

Comprehensive Composite Materials II

F. Langlais and G.L. Vignoles
Comprehensive Composite Materials II 86 (2018)
https://doi.org/10.1016/B978-0-12-803581-8.03912-6

Fundamental Evaluation of Gas-Phase Elementary Reaction Models for Silicon Carbide Chemical Vapor Deposition

Yuichi Funato, Noboru Sato, Yasuyuki Fukushima, et al.
ECS Journal of Solid State Science and Technology 6 (7) P399 (2017)
https://doi.org/10.1149/2.0141707jss

Transient stages during the chemical vapour deposition of silicon carbide from CH3SiCl3/H2: impact on the physicochemical and interfacial properties of the coatings

Georges Chollon, Francis Langlais, Maud Placide and Patrick Weisbecker
Thin Solid Films 520 (19) 6075 (2012)
https://doi.org/10.1016/j.tsf.2012.05.066