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Cited article:

Synthesis of a material for semiconductor applications: Boron oxynitride prepared by low frequency rf plasma-assisted metalorganic chemical vapor deposition

G. C. Chen, D.-C. Lim, S.-B. Lee, et al.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 21 (4) 1886 (2003)
https://doi.org/10.1116/1.1585072

Structures and properties of BON and multilayered TiN/BON thin films prepared by PAMOCVD method

D.-C Lim, G.C Chen, S.-B Lee and J.-H Boo
Surface and Coatings Technology 163-164 318 (2003)
https://doi.org/10.1016/S0257-8972(02)00636-9