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Cited article:

Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD

F. Hamelmann, A. Aschentrup, J. Schmalhorst, U. Kleineberg, U. Heinzmann, K. Dittmar, P. Jutzi

J. Phys. IV France, 11 PR3 (2001) Pr3-431-Pr3-436

DOI: https://doi.org/10.1051/jp4:2001354

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This article has been cited by the following article(s):

Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases

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Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions

F Hamelmann, A Aschentrup, A Brechling, et al.
Vacuum 75 (4) 307 (2004)
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Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition

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