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Deposition and characterization of CVD – MoO₃ thin films

K.A. Gesheva, T. Ivanova, A. Iossifova, D. Gogova, R. Porat

J. Phys. IV France, 09 PR8 (1999) Pr8-453-Pr8-459

DOI: https://doi.org/10.1051/jp4:1999857

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Citations de cet article :

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