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Cited article:

Study of the growth mechanisms of low-pressure chemically vapour deposited silica films

F. Ojeda, R. Cuerno, R. Salvarezza, L. Vázquez

J. Phys. IV France, 09 PR8 (1999) Pr8-265-Pr8-271

DOI: https://doi.org/10.1051/jp4:1999833

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This article has been cited by the following article(s):

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Handbook of Surfaces and Interfaces of Materials 229 (2001)
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