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Influence of ion mixing on the energy dependence of the ion-assisted chemical etch rate in reactive plasmas

L. Stafford, S. J. Pearton and J. Margot
Journal of Applied Physics 100 (6) 063309 (2006)
https://doi.org/10.1063/1.2349544

Energy dependence of ion-assisted chemical etch rates in reactive plasmas

L. Stafford, J. Margot, M. Chaker and S. J. Pearton
Applied Physics Letters 87 (7) 071502 (2005)
https://doi.org/10.1063/1.2031936

Characterization of neutral, positive, and negative species in a chlorine high-density surface-wave plasma

L. Stafford, J. Margot, M. Chaker and O. Pauna
Journal of Applied Physics 93 (4) 1907 (2003)
https://doi.org/10.1063/1.1538313

Investigation of the gas pressure influence on patterned platinum etching characteristics using a high-density plasma

S. Delprat, M. Chaker and J. Margot
Journal of Applied Physics 89 (1) 29 (2001)
https://doi.org/10.1063/1.1330554

Laser-induced photodetachment in high-density low-pressure SF[sub 6] magnetoplasmas

L. St-Onge, M. Chaker and J. Margot
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18 (5) 2363 (2000)
https://doi.org/10.1116/1.1285935

Photodetachment diagnostic techniques for measuring negative ion densities and temperatures in plasmas

M. Bacal
Review of Scientific Instruments 71 (11) 3981 (2000)
https://doi.org/10.1063/1.1310362

Experimental investigation of a large volume magnetoplasma source based on surface-wave propagation

L St-Onge, J Margot and M Chaker
Plasma Sources Science and Technology 7 (2) 154 (1998)
https://doi.org/10.1088/0963-0252/7/2/010