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Cited article:

A comparative study of O₂/SiH₄ and N₂O/SiH₄ mixtures for SiO₂ deposition in a microwave afterglow

H. DEL PUPPO, J. DESMAISON, L. PECCOUD

J. Phys. IV France, 03 C3 (1993) C3-241-C3-246

DOI: https://doi.org/10.1051/jp4:1993332

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