| Numéro |
J. Phys. IV France
Volume 05, Numéro C5, Juin 1995
Proceedings of the Tenth European Conference on Chemical Vapour Deposition
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| Page(s) | C5-407 - C5-414 | |
| DOI | https://doi.org/10.1051/jphyscol:1995547 | |
J. Phys. IV France 05 (1995) C5-407-C5-414
DOI: 10.1051/jphyscol:1995547
MOCVD of High Quality YBa2Cu3O7-δ Thin Films Using Novel Fluorinated and Non-Fluorinated Precursors
B.C. Richads, S.L. Cook, D.L. Pinch and G.W. AndrewsThe Associated Octel Compagny Ltd., P.O. Box 17, Oil Sites Road, Ellesmere Port, South Wirral, L65 4HF, U.K.
Abstract
The first high quality, YBa2Cu3O7-δ thin films have been produced by MOCVD using the novel fluorinated and non-fluorinated precursors, [Ba(TDFND)2.tetraglyme]1, [Cu(TDFND)2 and [Y(TMHD)3.4-'BuPyNO]2 and the traditional β-diketonate complexes [Y(TMHD)3]3 and[Cu(TMHD)2]. The novel precursors are thermally stable and highly volatine. Their low melting points, < 100°C, offer the advantage that they are liquid at the temperature of use. The removal of fluorine is effected by in situ water treatment. For films deposited on SrTiO3 the composition and surface morphology has been shown to be uniform over a 20 mm radius. The c axis orientation of the films has been confirmed by X-ray Diffraction and Rocking Curve Analysis. AC susceptibility has been used to show typical films possess a critical temperature, Tc > 90 K and critical current density, Jc > 106 Acm-2 at 77K. Fluorine content ≈ 100 ppm has been determined by SIMS.
© EDP Sciences 1995