Table of contents
Le Journal de Physique IV
Vol. 11 No. PR3 (Août 2001)
Thirteenth European Conference on Chemical Vapor Deposition
- Thermodynamic, kinetic and mass transport calculations, as the basis for materials processing by CVD
p. Pr3-3
C. Bernard
Abstract | PDF file (920.4 KB) - Insights into the MOCVD process of GaN using single-source precursors. Matrix isolation : A powerful technique
p. Pr3-17
J. Müller, B. Witting, H. Sternkicker and S. Bendix
Abstract | PDF file (290.3 KB) - The growth kinetics study of CVD Cu on TiN barriers
p. Pr3-23
W. Pan, D.R. Evans, R. Barrowcliff and S.T. Hsu
Abstract | PDF file (937.0 KB) - The role of atomic surface structure in the metalorganic chemical vapor deposition of III-V compound semiconductors
p. Pr3-31
R.F. Hicks, Q. Fu, L. Li, S.B. Visbeck, Y. Sun, C.H. Li and D.C. Law
Abstract | PDF file (1.767 MB) - Thermodynamic and kinetic criteria to select hydrocarbon precursor
p. Pr3-39
S. de Persis and F. Teyssandier
Abstract | PDF file (1.170 MB) - A study of morphology and texture of LPCVD germanium-silicon films
p. Pr3-47
A. Kovalgin and J. Holleman
Abstract | PDF file (2.388 MB) - Chemical vapor deposition of silicon carbide at various temperatures and surface area/volume ratios
p. Pr3-55
W.G. Zhang and K.J. Hüttinger
Abstract | PDF file (647.9 KB) - Density functional study on the adsorption of DMAH on hydrogen terminated Si(111) surfaces
p. Pr3-63
T. Matsuwaki, T. Nakajima and K. Yamashita
Abstract | PDF file (1.905 MB) - (HFA)Cu . 1,5-COD as the prospective precursor for CVD-technologies : The electronic structure, thermodynamical properties and process of formation of thin copper films
p. Pr3-69
T.I. Liskovskaya, L.G. Bulusheva, A.V. Okotrub, S.A. Krupoder, P.P. Semyannikov, I. P. Asanov, I.K. Igumenov, A.V. Manaev, V.F. Traven and A.G. Cherkov
Abstract | PDF file (913.6 KB) - Elementary steps and application of the CVD of SiC/BN double layers
p. Pr3-77
S. Hemeltjen, J. Heinrich, G. Marx, D. Dietrich, K. Nestler, K. Weise and S. Stöckel
Abstract | PDF file (919.6 KB) - Thermodynamic and experimental study of low temperature ZrB2 chemical vapor deposition
p. Pr3-85
J.F. Pierson, T. Belmonte and H. Michel
Abstract | PDF file (366.7 KB) - MOCVD of lead-containing perovskites
p. Pr3-93
A.A. Bosak, A.N. Botev, O.Yu. Gorbenko, I.E. Graboy, S.V. Samoilenkov, A.R. Kaul, C. Dubourdieu and J.-P. Sénateur
Abstract | PDF file (338.0 KB) - Kinetic modelling of gas-phase decomposition of propane : Correlation with pyrocarbon deposition
p. Pr3-101
B. Descamps, G.L. Vignoles, O. Féron, J. Lavenac and F. Langlais
Abstract | PDF file (477.5 KB) - Transition and rare earth metal fluorides as thermal sources of atomic and molecular fluorine
p. Pr3-109
J.V. Rau, N.S. Chilingarov, M.S. Leskiv, V.F. Sukhoverkhov, V. Rossi Albertini and L.N. Sidorov
Abstract | PDF file (130.9 KB) - Multiscale approach to material synthesis by gas phase deposition
p. Pr3-117
M. Masi
Abstract | PDF file (677.1 KB) - Modelling of silica film growth by chemical vapour deposition : Influence of the interface properties
p. Pr3-129
L. Vázquez, F. Ojeda, R. Cuerno, R. Salvarezza and J.M. Albella
Abstract | PDF file (678.6 KB) - Kinetics of LPCVD of gallium nitride and oxynitride films based on pyrolysis of a gallium chloride complex with ammonia GaCl3NH3
p. Pr3-141
S.E. Alexandrov and V.A. Kriakin
Abstract | PDF file (369.2 KB) - Atmospheric pressure chemical vapour deposition of BPSG films from TEOS, O3, TMB, TMPi : Determination of a chemical mechanism
p. Pr3-149
J.-P. Nieto, B. Caussat, J.-P. Couderc, I. Orain and L. Jeannerot
Abstract | PDF file (269.4 KB) - Kinetics of LPCVD of aluminium nitride films based on pyrolysis of aluminium chloride complex
p. Pr3-155
S.E. Alexandrov and V.A. Chistiakov
Abstract | PDF file (318.6 KB) - Two-dimensional simulation of a pulsed-power electronegative discharge
p. Pr3-163
B. Ramamurthi and D.J. Economou
Abstract | PDF file (402.9 KB) - Heat and mass transfer during producing silicon layers by chloride LPCVD process
p. Pr3-171
V.G. Minkina
Abstract | PDF file (236.9 KB) - Thermodynamic modelling of the chemical vapour deposition of boron nitride in the B-N-H-He-O system
p. Pr3-177
A.N. Golubenko, M.L. Kosinova and F.A. Kuznetsov
Abstract | PDF file (256.5 KB) - Computational analysis of horizontal cold wall CVD reactors at low pressure : Application to tungsten deposition from pyrolysis of W(CO)6
p. Pr3-183
T.C. Xenidou, M.K. Koukou, A.G. Boudouvis and N.C. Markatos
Abstract | PDF file (634.3 KB) - Kinetics of the initial stages of film formation during low pressure chemical vapour deposition of polysilicon by pyrolysis of silane
p. Pr3-189
L. Zambov, B. Caussat, R. Boubeker and J.-P. Couderc
Abstract | PDF file (368.6 KB) - Computational design and analysis of MOVPE reactors
p. Pr3-197
R.P. Pawlowski, A.G. Salinger, L.A. Romero and J.N. Shadid
Abstract | PDF file (1001 KB) - A TCAD tool for the simulation of the CVD process based on cellular automata
p. Pr3-205
G.Ch. Sirakoulis, I. Karafyllidis and A. Thanailakis
Abstract | PDF file (1.560 MB) - Effect of the precursors on the deposition of (Ba, Sr)TIO3 films
p. Pr3-215
J.-H. Lee, W.-Y. Yang, S.-W. Rhee and D. Kim
Abstract | PDF file (730.5 KB) - Halide CVD of dielectric and ferroelectric oxides
p. Pr3-223
A. Harsta
Abstract | PDF file (1.549 MB) - Low pressure chemical vapor deposition of silicon oxynitride films using tetraethylorthosilicate, dichlorosilane and ammonia mixtures
p. Pr3-231
V. Em. Vamvakas, R. Berjoan, S. Schamm, D. Davazoglou and C. Vahlas
Abstract | PDF file (404.9 KB) - Low pressure chemical vapor deposition of CuxS
p. Pr3-239
B. Meester, L. Reijnen, F. de Lange, A. Goossens and J. Schoonman
Abstract | PDF file (344.8 KB) - Perovskite heterostructures grown by MOCVD
p. Pr3-247
O.Yu. Gorbenko, I.E. Graboy, M.A. Novozhilov, A.R. Kaul, G. Wahl and V.L. Svetchnikov
Abstract | PDF file (2.509 MB) - Epitaxial growth of heavily P-doped Si films at 450 °C by alternately supplied PH3 and SiH4
p. Pr3-255
Y. Shimamune, M. Sakuraba, T. Matsuura and J. Murota
Abstract | PDF file (850.3 KB) - Organic chemistry by CVD
p. Pr3-261
L. He, M.L. Hitchman, S.H. Shamlian and S.E. Alexandrov
Abstract | PDF file (333.5 KB) - Molecular magnets and conductors on surfaces
p. Pr3-271
H. Casellas, D. de Caro, L. Valade and L. Ariès
Abstract | PDF file (590.3 KB) - Modification of activated carbon fiber pore structure by coke deposition
p. Pr3-279
X. Dabou, P. Samaras and G.P. Sakellaropoulos
Abstract | PDF file (775.7 KB) - Properties of thin AIN films prepared by PECVD and rapid thermal processes
p. Pr3-287
G.D. Beshkov, S.S. Georgiev, K.G. Grigorov, H.S. Maciel, A. Djouadi and M. Marinov
Abstract | PDF file (621.0 KB) - CVD growth of silicon films at high rates
p. Pr3-293
M. Hofstätter, B. Atakan and K. Kohse-Höinghaus
Abstract | PDF file (1.257 MB) - Nucleation and growth of silicon on ceramic substrates by RTCVD at atmospheric pressure
p. Pr3-301
A. Slaoui and S. Bourdais
Abstract | PDF file (1.329 MB) - An extended interpretation of chemical vapor infiltration of carbon
p. Pr3-307
Z.J. Hu, W.G. Zhang and K.J. Hüttinger
Abstract | PDF file (240.2 KB) - Structural and morphological changes in low temperature annealed LPCVD Si layers
p. Pr3-315
B. Cobianu, M. Modreanu, M. Danila, R. Gavrila, M . Bercu and M. Gartner
Abstract | PDF file (401.1 KB) - Growth of Ru and RuO2 films by metal-organic chemical vapour deposition
p. Pr3-325
F. Fröhlich, D. Machajdik, V. Cambel, J. Fedor, A. Pisch and J. Lindner
Abstract | PDF file (370.2 KB) - Growth of magnetoresistant La1-xMnO3 films on r-plane cut sapphire
p. Pr3-333
K. Fröhlich, M. Pripko, I. Vávra, K. Dénesová and D. Machajdík
Abstract | PDF file (268.7 KB) - Structural properties of [(La0.7Sr0.3MnO3/SrTiO3)]15 superlattices prepared by pulsed injection-MOCVD
p. Pr3-341
M. Rosina, C. Dubourdieu, F. Weiss, J.P. Sénateur and K. Fröhlich
Abstract | PDF file (270.1 KB) - Influence of hydrogen on chemical beam epitaxy of GaAs using triethylgallium and diethylarsine
p. Pr3-349
F. Maury and E. Bedel-Pereira
Abstract | PDF file (395.6 KB) - Treatment of polyethylene terephthalate in a He glow discharge
p. Pr3-357
D.D. Papakonstantinou, D. Mataras and Arefi-Khonsari
Abstract | PDF file (247.5 KB) - Photodegradative properties of TiO2 films prepared by MOCVD
p. Pr3-363
I. Justicia, J.A. Ayllón, A. Figueras, G.A. Battiston and R. Gerbasi
Abstract | PDF file (322.2 KB) - Advances in the use of MOCVD methods for the production of novel photonic bandgap materials
p. Pr3-371
D.E. Whitehead, M.E. Pemble, H.M. Yates, A. Blanco, C. Lopez, H. Miguez and F.J. Meseguer
Abstract | PDF file (278.3 KB) - Tin oxide APCVD thin films grown by SnCl4 oxidation on glass and Si substrates in a cold wall reactor
p. Pr3-377
A. Koutsogianni and D. Tsamakis
Abstract | PDF file (264.3 KB) - Preparation and optical study of APCVD mixed metal oxide films
p. Pr3-385
T. Ivanova, K.A. Gesheva, A. Szekeres, A. Maksimov and S. Zaitzev
Abstract | PDF file (245.9 KB) - Processing of (PyC/TiC)n multilayered coatings by pulsed CVD and RCVD
p. Pr3-391
O. Rapaud, H. Vincent, C. Vincent, S. Jacques and J. Bouix
Abstract | PDF file (391.1 KB) - Carbon nanotubes by CVD and applications
p. Pr3-401
A. Cassell, L. Delzeit, C. Nguyen, R. Stevens, J. Han and M. Meyyappan
Abstract | PDF file (1.823 MB) - Synthesis and characterization of carbon nanotubes
p. Pr3-411
J. B. Nagy and A. Fonseca
Abstract | PDF file (1.471 MB) - Gas-phase stability of c-BN clusters
p. Pr3-423
K. Larsson
Abstract | PDF file (364.9 KB) - Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD
p. Pr3-431
F. Hamelmann, A. Aschentrup, J. Schmalhorst, U. Kleineberg, U. Heinzmann, K. Dittmar and P. Jutzi
Abstract | PDF file (247.2 KB) - Nanoscale cobalt oxides thin films obtained by CVD and sol-gel routes
p. Pr3-437
L. Armelao, D. Barreca, S. Gross and E. Tondello
Abstract | PDF file (817.2 KB) - Chemical vapour deposition - a promising method for production of different kinds of carbon nanotubes
p. Pr3-445
A. Leonhardt, M. Ritschel, K. Bartsch, A. Graff, C. Täschner and J. Fink
Abstract | PDF file (1.830 MB) - Nanophased ZrO2-CeO2 or TiO2-ZrO2-CeO2 films by CVD as catalysts for hydrocarbon complete combustion
p. Pr3-453
D. Barreca, G.A. Battiston, U. Casellato, R. Gerbasi, E. Roncari, E. Tondello and P. Zanella
Abstract | PDF file (1.331 MB) - Formation of cubic SiC nanocrystals by laser-assisted CVD
p. Pr3-461
Y. Kamlag, A. Goossens, I. Colbeck and J. Schoonman
Abstract | PDF file (591.7 KB) - Nanocrystalline ZnO from siloxy-substituted single-source precursors
p. Pr3-467
K. Merz, R. Schoenen and M. Driess
Abstract | PDF file (433.7 KB) - Synthesis of GaN particles in porous matrices by chemical vapor infiltration of single molecule precursors
p. Pr3-473
H. Parala, A. Devi, W. Rogge, A. Birkner and R.A. Fischer
Abstract | PDF file (1.105 MB) - Synthesis of nanocomposite Pd balls and wires by chemical vapor infiltration
p. Pr3-481
K.-B. Lee, C.-S. Choi, S.J. Oh, H.-C.Ri and J. Cheon
Abstract | PDF file (282.3 KB) - Composition, morphology and particle size control in nanocrystalline iron oxide films grown by single-source CVD
p. Pr3-487
S. Mathur, M. Veith, V. Sivakov, H. Shen and H.-B. Gao
Abstract | PDF file (527.6 KB) - Advances in copper CVD for the semiconductor industry
p. Pr3-497
J.A.T. Norman
Abstract | PDF file (418.9 KB) - General aspects of surface chemistry of metal β-diketonates
p. Pr3-505
I.K. Igumenov, A.E. Turgambaeva and P.P. Semyannikov
Abstract | PDF file (537.8 KB) - Fundamental studies on the decomposition mechanism of Ti(OC3H7)4 and TiO2 film evolution on Si(100) and Pt(100) surfaces
p. Pr3-517
S.-I. Cho, S.H. Moon and C.-H. Chung
Abstract | PDF file (373.2 KB) - Growth of galliumnitride on sapphire and silicon using propylamine as nitrogen precursor
p. Pr3-525
B. Atakan and Z.-J. Liu
Abstract | PDF file (341.8 KB) - Direct liquid injection MOCVD growth of TiO2 films using the precursor Ti(mpd)(dmae)2
p. Pr3-531
A. Awaluddin, M.E. Pemble, A.C. Jones and P.A. Williams
Abstract | PDF file (347.0 KB) - Al2O3 growth optimisation using aluminium dimethylisopropoxide as precursor as a function of reaction conditions and reacting gases
p. Pr3-539
D. Barreca, G.A. Battiston, G. Carta, R. Gerbasi, G. Rossetto, E. Tondello and P. Zanella
Abstract | PDF file (379.6 KB) - Synthesis of siloxy- and alkoxy-substituted ZnO-aggregates for CVS of ZnO
p. Pr3-547
R. Schoenen, K. Merz, S. Rell and M. Driess
Abstract | PDF file (172.8 KB) - CVD copper thin film deposition using (α-methylstyrene)Cu(I)(hfac)
p. Pr3-553
W. Zhuang, L.J. Charneski, D.R. Evans, S.T. Hsu, Z. Tang and A.M. Guloy
Abstract | PDF file (357.5 KB) - Metal and oxide thin film MO CVD as a base for nanostructure and superlattice formation
p. Pr3-561
V.V. Bakovets, N.V. Gelfond, V.N. Mitkin, T.M. Levashova, I.P. Dolgovesova, V.T. Ratushnjak and V.G. Martynets
Abstract | PDF file (718.6 KB) - Chemical vapour deposition of copper using copper(II) alkoxides
p. Pr3-569
R. Becker, J. Weiß, A. Devi and R.A. Fischer
Abstract | PDF file (534.8 KB) - Growth of InN whiskers from single source precursor
p. Pr3-577
A. Devi, H. Parala, W. Rogge, A. Wohlfart, A. Birkner and R.A. Fischer
Abstract | PDF file (854.3 KB) - New volatile polyazolylborates of copper(I) for MOCVD
p. Pr3-585
A. Drozdov, S.I. Troyanov, C. Pettinari, F. Marchetti, C. Santini, R. Pettinari, G.A. Battiston and R. Gerbasi
Abstract | PDF file (592.0 KB) - MO CVD obtaining composite coatings from metal of platinum group on titanium electrodes
p. Pr3-593
N.V. Gelfond, P.S. Galkin, I. K. Igumenov, N.B. Morozova, N.E. Fedotova, G.I. Zharkova and Yu.V. Shubin
Abstract | PDF file (306.5 KB) - MOCVD of rhenium-containing complex oxides with the new thd-precursor
p. Pr3-601
O.Yu. Gorbenko, S.I. Troyanov, A.A. Zakharov and A.A. Bosak
Abstract | PDF file (1.658 MB) - Vapor pressure of precursors for CVD on the base of platinum group metals
p. Pr3-609
N.B. Morozova, G.I. Zharkova, P.P. Semyannikov, S.V. Sysoev, I.K. Igumenov, N.E. Fedotova and N.V. Gelfond
Abstract | PDF file (329.4 KB) - Investigation of composition, optical and electrophysical properties of tin dioxide films made by oxidative pyrolysis of tetraethyltin
p. Pr3-617
B. Kozyrkin
Abstract | PDF file (170.4 KB) - Thermal conversions of some Ba, Sr, Ti oxide precursors for CVD
p. Pr3-621
A.E. Turgambaeva and I.K. Igumenov
Abstract | PDF file (297.3 KB) - CVD deposition of cobalt oxide (CO3O4) from Co(acac)2
p. Pr3-629
E. Fischer Rivera, B. Atakan and K. Kohse-Höinghaus
Abstract | PDF file (1.106 MB) - Cobalt oxide thin films prepared by metalorganic chemical vapor deposition from cobalt acetylacetonate
p. Pr3-637
A.U. Mane, K. Shalini and S.A. Shivashankar
Abstract | PDF file (733.7 KB) - MOCVD of Ag thin films
p. Pr3-645
S. Paramonov, S. Samoilenkov, S. Papucha, I. Malkerova, A. Alikhanyan, N. Kuzmina, S.I. Troyanov and A.R. Kaul
Abstract | PDF file (375.5 KB) - Deposition by an aerosol assisted MOCVD process of Eu or Er doped Y2O3-P2O5 thin films
p. Pr3-653
J.L. Deschanvres and W. Meffre
Abstract | PDF file (294.4 KB) - Volatility studies on single source precursors for LaNiO3 film deposition: Mass spectrometry and thermal analysis
p. Pr3-661
N. Kuzmina, I. Malkerova, M. Ryazanov, A. Alikhanyan, A. Rogachev and A.N. Gleizes
Abstract | PDF file (322.9 KB) - Characterization of a solvant-free vapour source for MOCVD
p. Pr3-669
C. Jimenez, H. Guillon, B. Pierret, O. Stadel, J. Schmidt, U. Krause and G. Wahl
Abstract | PDF file (242.3 KB) - Influence of thermal decomposition behavior of titanium precursors on (Ba,Sr)TiO3 thin films
p. Pr3-675
Y.S. Min, Y.J. Cho, D. Kim, J.H. Lee, B.M. Kim, S.K. Lim, I.M. Lee and W.I. Lee
Abstract | PDF file (299.8 KB) - Growth of porous columnar α-GaN layers on c-plane Al2O3 by MOCVD using Bisazido dimethylaminopropyl gallium as single source precursor
p. Pr3-683
A. Wohlfart, A. Devi, F. Hipler, H.W. Becker and R.A. Fischer
Abstract | PDF file (216.7 KB) - Remote hydrogen plasma chemical vapor deposition from alkylsilane and alkylcarbosilane single-sources: Mechanism of the process and properties of resulting silicon-carbon deposits
p. Pr3-691
A.M. Wrobel
Abstract | PDF file (544.6 KB) - Photon assisted CVD
p. Pr3-703
K. Piglmayer, M. Boman, M. Lindstam and R. Chabicovsky
Abstract | PDF file (640.0 KB) - Electron-impact silane dissociation and deposition rate relationship in the PECVD of microcrystalline silicon thin films
p. Pr3-715
E. Amanatides, D.E. Rapakoulias and D. Mataras
Abstract | PDF file (446.6 KB) - Microwave plasma enhanced CVD of aluminum oxide films: Influence of the deposition parameter on the films characteristics
p. Pr3-723
H. Hidalgo, P. Tristant, A. Denoirjean and J. Desmaison
Abstract | PDF file (374.7 KB) - Comparative characterization of nitrogen-rich CNx films prepared by different ICP-CVD techniques
p. Pr3-731
C. Popov, J. Bulir, L. Zambov, M. Jelinek and M.-P. Delplancke-Ogletree
Abstract | PDF file (442.3 KB) - GeO2 and SiO2 thin film preparation with CVD using ultraviolet excimer lamps
p. Pr3-739
K. Kurosawa, Y. Maezono, J.-I. Miyano, T. Motoyama and A. Yokotani
Abstract | PDF file (336.3 KB) - Room temperature SiO2 films deposited by multipolar ECR PECVD
p. Pr3-747
G. Isai, A. Kovalgin, J. Holleman, P. Woerlee and H. Wallinga
Abstract | PDF file (368.6 KB) - Aluminium nitride synthesis by RPECVD
p. Pr3-755
T. Belmonte, J.Y. Poussardin, L. Lefèvre and H. Michel
Abstract | PDF file (410.0 KB) - Growth of BON thin films by plasma assisted MOCVD and study of deposition parameter effects on the film structure
p. Pr3-763
G.C. Chen, M.C. Kim, T.H. Kim, S.-B. Lee and J.-H. Boo
Abstract | PDF file (328.1 KB) - RMPECVD of silica films with a high microwave power (1600 W) parametric studies
p. Pr3-771
P. Tristant, J. Desmaison, F. Naudin and D. Merle
Abstract | PDF file (373.5 KB) - Effect of double-layers formation on the deposition of microcrystalline silicon films in hydrogen diluted silane discharges
p. Pr3-779
A. Hammad, E. Amanatides, D.E. Rapakoulias and D. Mataras
Abstract | PDF file (400.9 KB) - Plasma enhanced decomposition of propylene on activated carbon fibers
p. Pr3-787
T. Orfanoudaki, I. Dolios, S. Korili, P. Samaras, N. Platakis and G.P. Sakellaropoulos
Abstract | PDF file (346.7 KB) - Effects of plasma power and deposition pressure on the properties of the low dielectric constant plasma polymerized cyclohexane thin films deposited by plasma enhanced chemical vapor deposition
p. Pr3-795
C. Shim, J. Yang, Y. C. Quan, J. Choi and D. Jung
Abstract | PDF file (421.2 KB) - Synthesis of hexagonal boron nitride thin films by a plasma assisted chemical vapor deposition method
p. Pr3-803
P. Thévenin, A. Soltani and A. Bath
Abstract | PDF file (301.4 KB) - Room temperature deposition of GeO2 thin film using dielectric barrier discharge driven excimer lamps
p. Pr3-811
Y. Maezono, H. Yanagita, K. Nishi, J.-I. Miyano, A. Yokotani, K. Kurosawa, N. Hishinuma and H. Matsuno
Abstract | PDF file (2.126 MB) - Low frequency PACVD of silicon-carbon alloys : Process study
p. Pr3-817
L. Thomas, J.M. Badie, E. Tomasella, M. Ducarroir and R. Berjoan
Abstract | PDF file (391.0 KB) - Selective area deposition of titanium dioxide thin films by light induced chemical vapour deposition
p. Pr3-825
E. Halary-Wagner, P. Lambelet, G. Benvenuti and P. Hoffmann
Abstract | PDF file (2.110 MB) - Thermal barrier coatings
p. Pr3-835
G. Wahl, Ch. Metz and S. Samoilenkov
Abstract | PDF file (1.470 MB) - Advances in chemically vapour deposited wear resistant coatings
p. Pr3-847
S. Ruppi
Abstract | PDF file (3.813 MB) - CVD mullite and mullite-alumina corrosion protection coatings for silicon based ceramics
p. Pr3-861
S. M. Zemskova, J. A. Haynes and K. M. Cooley
Abstract | PDF file (1.552 MB) - Yttrium containing aluminide layers
p. Pr3-869
Ch. Metz, G. Wahl, P. Bianchi, M. Innocenti, D. Baxter, N. Archer and R. Wing
Abstract | PDF file (271.6 KB) - Fiber-coatings for fiber-reinforced mullite/mullite composites
p. Pr3-877
K. Nubian, G. Wahl, B. Saruhan and H. Schneider
Abstract | PDF file (879.7 KB) - Coating of continuous carbon fibers with double layers by chemical vapor deposition
p. Pr3-885
N. Popovska, S. Schmidt, E. Edelmann, V. K. Wunder, H. Gerhard and G. Emig
Abstract | PDF file (2.052 MB) - Wear behavior of PACVD tin coatings deposited onto tool steels
p. Pr3-893
M. stoiber, G . Fontalvo, M. Panzenböck, C. Mitterer, C. Lugmair and R. Kullmer
Abstract | PDF file (527.8 KB) - Formation of high moisture and dopant diffusion resistivity silicon nitride films by catalytic-CVD method
p. Pr3-901
A. Izumi, H. Sato and H. Matsumura
Abstract | PDF file (277.1 KB) - Investigation of the tantalum chlorination with hydrogen chloride for LPCVD tantalum elaboration
p. Pr3-907
A. Levesque and A. Bouteville
Abstract | PDF file (234.1 KB) - Evaluation of corrosion behaviour of tantalum coating obtained by low pressure chemical vapor deposition using electrochemical polarization
p. Pr3-915
A. Levesque and A. Bouteville
Abstract | PDF file (245.0 KB) - In situ characterization of atomic layer deposition of SrTiO3
p. Pr3-923
A. Rahtu, T. Hänninen and M. Ritala
Abstract | PDF file (336.8 KB) - MOCVD grown InGaP/GaAs multiple negative-differential-resistance (MNDR) resonant-tunneling bipolar transistors
p. Pr3-931
W.-C. Liu, H.-J. Pan, C.-H. Yen, K.-P. Lin, C.-Z. Wu, W.-H. Chiou and C.-Y. Chen
Abstract | PDF file (272.1 KB) - Development of SiNx LPCVD processes for microtechnological applications
p. Pr3-937
B. Rousset, L. Furgal, P. Fadel, A. Fulop, D. Pujos and P. Temple-Boyer
Abstract | PDF file (349.4 KB) - High-performance In0.49Ga0.51P/InGaAs single and double delta-doped pseudomorphic high electron mobility transistors (δ-PHEMT's)
p. Pr3-945
W.-C. Liu, K.-W. Lin, K.-H. Yu, W.-L. Chang, C.-C. Cheng, C.-K. Wang and H.-M. Chang
Abstract | PDF file (249.7 KB) - MOCVD grown InGaP/GaAs camel-like field-effect transistor for high-breakdown and high-temperature operations
p. Pr3-951
W.-C. Liu, K.-H. Yu, K.-W. Lin, K.-P. Lin, C.-H. Yen, C.-C. Cheng, C.-K. Wang and H.-M. Chuang
Abstract | PDF file (217.1 KB) - A systematic study of MOCVD grown InP/InGaAIAs heterojunction bipolar transistors with anomalous switching behavior
p. Pr3-957
W.-C. Liu, W.-C. Wang, C.-H. Yen, C.-C. Cheng, C.-Z. Wu, W.-H. Chiou and C.-Y. Chuen
Abstract | PDF file (221.5 KB) - Characterisation of LPCVD silicon oxynitride films by optical spectroscopy
p. Pr3-963
M. Bercu, C. Cobianu, M. Modreanu and B.N. Bercu
Abstract | PDF file (408.8 KB) - Characterization of the core structure of growth defects in CVD diamond films by UHREM : Z-shaped twin interactions
p. Pr3-971
D. Dorignac, S. Delclos, F. Phillipp, F. Silva and A. Gicquel
Abstract | PDF file (1.174 MB) - Structure study of thin RPECVD CdxZn1-xS films
p. Pr3-979
N.I. Fainer, M.L. Kosinova, Yu.M. Rumyantsev, E.A. Maximovski, M. Terauchi, K. Shibata, F. Satoh, M. Tanaka, N.P. Sysoeva and F.A. Kuznetsov
Abstract | PDF file (426.4 KB) - Structure and composition investigation of RPECVD SiCN and LPCVD BCN films
p. Pr3-987
M.L. Kosinova, N.I Fainer, Yu.M. Rumyantsev, M. Terauchi, K. Shibata, F. Satoh, M. Tanaka and F.A. Kuznetsov
Abstract | PDF file (466.5 KB) - In situ mass spectrometry during thermal CVD of the tris-acetylacetonates of 3-d transition metals
p. Pr3-995
P.P. Semyannikov, I.K. Igumenov, S.V. Trubin and I.P. Asanov
Abstract | PDF file (379.6 KB) - Characterization of low-dielectric constant SiOCN films synthesized by low pressure chemical vapour deposition
p. Pr3-1005
L.M. Zambov, B. Ivanov, C. Popov, G. Georgiev, I. Stoyanov and D.B. Dimitrov
Abstract | PDF file (414.8 KB) - Deposition process of laminar pyrocarbon from propane
p. Pr3-1013
J. Lavenac, F. Langlais, X. Bourrat and R. Naslain
Abstract | PDF file (488.2 KB) - APCVD-molybdenum oxide thin films : Vibrational and optical properties
p. Pr3-1023
K.A. Gesheva, T. Ivanova, A. Szekeres, A. Maksimov and S. Zaitzev
Abstract | PDF file (254.8 KB) - Influence of texture on the absorption threshold of LPCVD silicon films
p. Pr3-1029
D. Davazoglou, D.N. Kouvatsos and E. Valamontes
Abstract | PDF file (396.6 KB) - Characterization and stressing properties of polysilicon TFTs utilizing oxide films deposited using TEOS
p. Pr3-1037
D.N. Kouvatsos, V.Em. Vamvakas and D. Davazoglou
Abstract | PDF file (400.6 KB) - MOCVD of antimony oxides for gas sensor applications
p. Pr3-1045
P. W. Haycock, G. A. Horley, K. C. Molloy, C. P. Myers, S. A. Rushworth and L. M. Smith
Abstract | PDF file (851.2 KB) - CVD techniques for gas separation membranes synthesis - characterization - applications
p. Pr3-1053
J. Durand and V. Rouessac
Abstract | PDF file (2.803 MB) - Nanocrystalline silicon quantum dots prepared by VHF plasma enhanced chemical vapor deposition
p. Pr3-1065
S. Oda and K. Nishiguchi
Abstract | PDF file (1.591 MB) - Group-III nitride growth in production scale MOVPE systems
p. Pr3-1073
B. Schineller, H. Protzmann, M. Luenenbuerger, M. Heuken, E.V. Lutsenko and G.P. Yablonskii
Abstract | PDF file (975.1 KB) - Simulation of the large-area growth of homoepitaxial 4H-Sic by chemical vapor deposition
p. Pr3-1079
M. Pons, J. Mezière, J. M. Dedulle, S. Wan Tang Kuan, E. Blanquet, C. Bernard, P. Ferret, L. Di Cioccio, T. Billon and R. Madar
Abstract | PDF file (1.848 MB) - Single source MOCVD system for deposition of superconducting films onto moved tapes
p. Pr3-1087
O. Stadel, J. Schmidt, N.V. Markov, S.V. Samoilenkov, G. Wahl, C. Jimenez, F. Weiss, D. Selbmann, J. Eickemeyer, O.Yu. Gorbenko, A.R. Kaul and A. Abrutis
Abstract | PDF file (1.648 MB) - Reactive pack-cementation coating of silicon carbide on carbon-carbon composite
p. Pr3-1095
O. Paccaud and A. Derré
Abstract | PDF file (987.9 KB) - Atomic layer deposition of CuxS
p. Pr3-1103
L. Reijnen, B. Meester, A. Goossens and J. Schoonman
Abstract | PDF file (579.5 KB) - Diagnostics of TiN coatings process in pulsed D.C plasma enhanced chemical vapor deposition
p. Pr3-1109
S. Ma, K. Xu and V. Ji
Abstract | PDF file (496.1 KB) - Spouted bed metallorganic chemical vapor deposition of ruthenium on NiCoCrAlYTa powders
p. Pr3-1117
F. Juarez, A. Castillo, B. Pieraggi and C. Vahlas
Abstract | PDF file (2.497 MB) - Deposition of Cr, Al coatings on Ni by means of a PB and FB CVD process
p. Pr3-1125
C. Christoglou and G.N. Angelopoulos
Abstract | PDF file (422.7 KB) - Study of SiO2-films deposited by adding N2O or O2 to TEOS in photo-chemical vapor deposition at room temperature
p. Pr3-1131
Y. Motoyama, J.-I. Miyano, K. Toshikawa, Y. Yagi, H. Yanagida, K. Kurosawa and A. Yokotani
Abstract | PDF file (357.1 KB) - The development of MOCVD techniques for ferroelectric and dielectric thin film depositions
p. Pr3-1139
T. Li and S.T. Hsu
Abstract | PDF file (374.3 KB) - Comparative study of atomic layer deposition and low-pressure MOCVD of copper sulfide thin films
p. Pr3-1147
B. Meester, L. Reijnen, A. Goossens and J. Schoonman
Abstract | PDF file (294.4 KB) - NIR diode laser based process control for industrial CVD reactors
p. Pr3-1153
V. Hopfe, D.W. Sheel, D. Raisbeck, J. M. Rivero, W. Graehlert, O. Throl, A.M.B. van Mol and C.I.M.A. Spee
Abstract | PDF file (299.6 KB) - Unique precursor delivery and control afforded by low-pressure pulsed-CVD process with ultrasonic atomization
p. Pr3-1161
S. Krumdieck, O. Sbaizero and R. Raj
Abstract | PDF file (462.1 KB) - Deposition of SrRuO3 films and SrRuO3/YBa2Cu3O7 heterostructures by pulsed injection MOCVD
p. Pr3-1169
A. Abrutis, V. Plausinaitiene, S. Pasko, A. Teiserskis, V. Kubilius, Z. Saltyte and J.-P. Sénateur
Abstract | PDF file (241.3 KB) - GaN heteroepitaxy by remote plasma MOCVD : Real time monitoring by laser reflectance interferometry
p. Pr3-1175
M. Losurdo, A. Grimaldi, M. Giangregorio, P. Capezzuto and G. Bruno
Abstract | PDF file (419.0 KB) - Area selective OMCVD of gold and palladium on self-assembled organic monolayers : Control of nucleation sites
p. Pr3-1183
R.A. Fischer, U. Weckenmann, C. Winter, J. Käshammer, V. Scheumann and S. Mittler
Abstract | PDF file (417.2 KB) - CVD modifications of porous Vycor silica for gas separation and sensor applications
p. Pr3-1191
E. Magoulianti, K. Beltsios, D. Davazoglou and N. Kanellopoulos
Abstract | PDF file (312.7 KB) - Fabrication of fine copper lines on AZ 5214TM patterned silicon substrates by selective chemical vapor deposition
p. Pr3-1197
A.N. Gleizes, S. Vidal and D. Davazoglou
Abstract | PDF file (308.9 KB)
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