Issue J. Phys. IV France Volume 133, June 2006 Page(s) 1161 - 1165 DOI 10.1051/jp4:2006133237 Published online 16 June 2006

Inertial Fusion Sciences and Applications 2005
J.-C. Gauthier, et al.
J. Phys. IV France 133 (2006) 1161-1165
DOI: 10.1051/jp4:2006133237

Development of EUV light source by laser-produced plasma

Y. Izawa¹, N. Miyanaga¹, H. Nishimura¹, S. Fujioka¹, T. Aota¹, Y. Tao¹, S. Uchida², Y. Shimada², K. Hashimoto², M. Yamaura², K. Nishihara¹, M. Murakami¹, A. Sunahara¹, H. Furukawa², A. Sasaki³, W. Nishikawa⁴, H. Tanuma⁵, T. Norimatsu¹, K. Nagai¹, Q. Gu¹, M. Nakatsuka¹, H. Fujita¹, K. Tsubakimoto¹, H. Yoshida¹ and K. Mima<sup>1

1</sup>  Institute of Laser Engineering, Osaka University, Osaka, Japan
²  Institute for Laser Technology, Osaka, Japan
³  Advanced Photon Research Center, Kansai Research Establishment, Japan Atomic Energy Research Institute, Kyoto, Japan
⁴  Faculty of Engineering, Okayama University, Okayama, Japan
⁵  Tokyo Metropolitan University, Hachioji, Tokyo, Japan

Abstract
We have been developing an EUV light source by laser-produced plasma for the use of EUV lithography system under the Leading Project promoted by MEXT. The project aims at understanding physics of laser plasma EUV source and providing database and guidelines for the practical EUV source. Progresses in theoretical modeling and experimental results are briefly reported.

© EDP Sciences 2006

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