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J. Phys. IV France 133 (2006) 1161-1165
Development of EUV light source by laser-produced plasmaY. Izawa1, N. Miyanaga1, H. Nishimura1, S. Fujioka1, T. Aota1, Y. Tao1, S. Uchida2, Y. Shimada2, K. Hashimoto2, M. Yamaura2, K. Nishihara1, M. Murakami1, A. Sunahara1, H. Furukawa2, A. Sasaki3, W. Nishikawa4, H. Tanuma5, T. Norimatsu1, K. Nagai1, Q. Gu1, M. Nakatsuka1, H. Fujita1, K. Tsubakimoto1, H. Yoshida1 and K. Mima1
1 Institute of Laser Engineering, Osaka University, Osaka, Japan
2 Institute for Laser Technology, Osaka, Japan
3 Advanced Photon Research Center, Kansai Research Establishment, Japan Atomic Energy Research Institute, Kyoto, Japan
4 Faculty of Engineering, Okayama University, Okayama, Japan
5 Tokyo Metropolitan University, Hachioji, Tokyo, Japan
We have been developing an EUV light source by laser-produced plasma for the use of EUV lithography system under the Leading Project promoted by MEXT. The project aims at understanding physics of laser plasma EUV source and providing database and guidelines for the practical EUV source. Progresses in theoretical modeling and experimental results are briefly reported.
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