J. Phys. IV France
Volume 123, March 2005
Page(s) 137 - 142

J. Phys. IV France 123 (2005) 137-142

DOI: 10.1051/jp4:2005123023

Chromium multilayered thin films with orientated microstructure

J. Takadoum, J. Lintymer, J. Gavoille and N. Martin

Laboratoire de Microanalyse des Surfaces (L.M.S.), École Nationale Supérieure de Mécanique et des Microtechniques (E.N.S.M.M.), 26 chemin de l'Épitaphe, 25030 Besançon Cedex, France

Chromium thin films exhibiting a columnar microstructure have been prepared by dc magnetron sputtering. The glancing angle deposition (GLAD) technique and the substrate motion have been implemented to sculpt this typical columnar microstructure into desired zigzag shapes. By changing the direction of the incident flux of the species impinging on the substrate surface, the deposited films led to columns that are tilted with respect to the substrate normal. A systematic and periodic variation of the angle of incidence "$\alpha $" from -50 to 50$^{\circ}$ allowed to achieve chromium multilayered thin films with a controlled zigzag microstructure. The growth mechanisms and the morphology of such films have been investigated by scanning electron microscopy. The effect of the angle of incidence and the half-period (one layer thickness) "$\lambda $" (50 $< \lambda < 1000$ nm) on porosity, film microstructure, deposition rate, and surface properties have mainly been studied.

© EDP Sciences 2005