J. Phys. IV France 104 (2003) 259
Wide range reflection multilayer in 200-25 nm region for Schwarzschild objectivesT. Ejima, K. Sudo, T. Hatano and M. Watanabe
Institute of Multidisciplinaly Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
Preliminary results of a wide range reflection multilayer in a range from 200 nm to 25 nm (6 eV to 50 eV) for normal incidence are reported. The structure of the multilayer is [SiC (6.0 nm)] (top single layer)/ [ Y 2O 3 (5.0 nm)/Mg (12.5 nm)/Y 2O 3 (3.3 nm)/Mg (10.0 nm)] (middle-aperiodic-layers)/ [ Y 2O 3 (3.0 nm)/Mg (9.9 nm)] l5 (piled-double-layers). Its normal incidence reflectance was more than 0.25 in 220-115 nm region and more than 0.04 in 34-24 nm region.
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