J. Phys. IV France 11 (2001) Pr8-427-Pr8-432
Ti-Pd-Ni high temperature shape memory thin films formed with carousel type magnetron sputtering apparatusT. Sawaguchi, M. Sato and A. Ishida
5thResearch Group, 2nd Subgroup, National Research Institute for Metals (NRIM), 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
High temperature shape memory thin films of Ti-Pd-Ni were formed with a carousel type magnetron sputtering apparatus. Four kinds of films with different compositions (a Ti-rich, a near stoichiometric, and two (Pd, Ni)-rich films) were prepared by independently applying D.C. powers to each pure metal target. The near stoichiometric sample with a composition of Ti49.5Pd28.5Ni22.0 was found to consist mainly of a Ti (Pd, Ni) phase, and showed a shape memory effect at about 500K with a recoverable transformation strain of 2.9% and a plastic strain of 0.3% at 160MPa. The Ti-rich film with a composition of Ti51.2Pd27.0Ni21.8 was found to contain a TiPd2 type second phase, and showed a shape memory effect at about 490K with a smaller recoverable transformation strain of 1.5% and a smaller plastic strain of 0.05% than those of the near stoichiometric film. One of the (Pd, Ni)-rich films with a composition of Ti47.9Pd29.8Ni22.3 was found to possess both B2 and B19 phases at ambient temperature, and showed a shape memory effect at 360K with a recoverable transformation strain of 2.5% almost as large as the near stoichiometric film, and showed a plastic strain of 0.05% as small as that of the Ti-rich film.
© EDP Sciences 2001