J. Phys. IV France 11 (2001) Pr3-177-Pr3-181
Thermodynamic modelling of the chemical vapour deposition of boron nitride in the B-N-H-He-O systemA.N. Golubenko1, M.L. Kosinova2 and F.A. Kuznetsov2
1 Novosibirsk State University, Novosibirsk 630090, Russia
2 Institute of Inorganic Chemistry, SB RAS, Novosibirsk 630090, Russia
Thermodynamic analysis of the chemical vapour deposition (CVD) of the different modifications of boron nitride (hexagonal h-BN, cubic c-BN and wurzite w-BN) was performed for the B-N-H-He-O system using the method of the minimisation of Gibbs free energy. The calculations were carried out for total pressure Ptot = 1.33 Pa in the temperature region of 300 - 2100 K. The composition of the initial gas mixture of borazine (B3N3H6) and helium (with the oxygen impurity) was varied in a wide range. The results are presented in the from of CVD phase diagrams. The influence of the oxygen traces on the temperature boundaries of the c-BN deposition field was shown.
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