J. Phys. IV France 11 (2001) Pr3-1183-Pr3-1190
Area selective OMCVD of gold and palladium on self-assembled organic monolayers : Control of nucleation sitesR.A. Fischer1, U. Weckenmann1, C. Winter1, J. Käshammer2, V. Scheumann2 and S. Mittler2
1 Anorganische Chemie II, Ruhr-Universität Bochum, 44780 Bochum, Germany
2 Max-Planck Institut für Polymerforschung, Ackermann Weg 10, 55128 Mainz, Germany
The area selective organometallic chemical vapor deposition (OMCVD) of gold and palladium onto self-assembled monolayers (SAMs) of 4'-functionalized long chain alkanethiols and 4'-functionalized biphenylthiols was investigated. Trimethylphosphine-methylgold (Me3PAuMe) and cyclopentadienyl-allyl-palladium (Cp(allyl)Pd) were used as organometallic precursors. X-ray photoelectron spectroscopy (XPS) revealed that in both cases nucleation occurs selectively only on thiol terminated surfaces even at very mild conditions whereas nucleation is inhibited on methyl- and hydroxy-terminated SAMs. It has been shown that it is possible to control the number of gold clusters per area by depositing gold onto mixed SAMs consisting of biphenylthiol and 4'-biphenyldithiol with varying molar ratios.
© EDP Sciences 2001