J. Phys. IV France 11 (2001) Pr3-923-Pr3-930
In situ characterization of atomic layer deposition of SrTiO3A. Rahtu, T. Hänninen and M. Ritala
Department of Chemistry, University of Helsinki, P.O. Box 55, 00014 Helsinki, Finland
The reaction mechanisms in the atomic layer deposition of SrO and SrTiO3 were studied with a quartz crystal microbalance and a quadrupole mass spectrometer at 325°C. The precursors were Sr(C5iPr3H2)2, Ti(OCH(CH3)2)4 and deuterated water. The main gaseous byproduct was C5iPr3H2. When SrO was grown on TiO2, the TiO2 surface affected the growth until it became covered with SrO. By contrat, the SrO surface did not have as significant effect to the growth of TiO2.
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