J. Phys. IV France 09 (1999) Pr8-501-Pr8-508
Low pressure chemical vapour deposition of CNx layers by interaction between tetramethylguanidine and cyanurchlorideL. Zambov1, B. Ivanov1, G. Georgiev1, C. Popov2, V. Vassilev1 and G. Beshkov3
1 University of Chemical Technology and Metallurgy, Department of Semiconductors, 1756 Sofia, Bulgaria
2 Central Laboratory of Photoprocesses, Bulgarian Academy of Sciences, 1113 Sofia, Bulgaria
3 Institute of Solid State Physics, Bulgarian Academy of Sciences, 1784 Sofia, Bulgaria
Possibilities are demonstrated for synthesis of CNx layers in a LPCVD reactor, using liquid and solid state source organic compounds. The influence of pressure and deposition temperature on the composition, structure and physico-chemical properties of the films is investigated. It is found that at a temperature range of 400 +600 °C, the layers obtained are transparent, colored on silicon, with good adhesion, homogeneous in morphology and uniform in thickness. Peculiar features of coatings are their amorphous nature, nitrogen to carbon relation 0.76 as well as possible hydrogen incorporation.
© EDP Sciences 1999