J. Phys. IV France 09 (1999) Pr8-133-Pr8-140
Theoretical analysis of a mass conservation equation for a surface reaction between two parallel plates of a chemical vapor deposition reactorN. Mise and T. Watanabe
Mechanical Engineering Research Laboratory, Hitachi Ltd., 502 Kandatsu, Tsuchiura, Ibaraki 300-0013, Japan
A steady-state, two-dimensional mass conservation equation for a surface reaction is theoretically analyzed in order to investigate how the pressure, reactor size, and so on influence the chemical vapor deposition. A theoretical solution is obtained on the assumptions of an isothermal environment between the two parallel plates (distance h), a constant flow velocity (u), and a balanced surface reaction rate (rate constant k) and diffusion flux (diffusion coefficient D) on the plates. The concentration C(x, y) of the reactive species normalized by the inlet concentration Co is expressed as [MATH] where θi tan θi = kh/2D which are key parameters. The deposition rate G(x) along the flow can be simplified to G(x)/G(0) = exp(-kx/2uh) when kh/2D << 1 and [MATH], which are often valid for low-pressure processes. We theoretically show that a higher rate results from a lower pressure when p > 100 Pa under kh/2D = 0.2, uh/2D = 1, and x/h = 10.
© EDP Sciences 1999