J. Phys. IV France 09 (1999) Pr8-117-Pr8-132
Some recent developments in chemical vapor deposition process and equipment modelingC.R. Kleijn, K.J. Kuijlaars, M. Okkerse, H. van Santen and H.E.A. van den Akker
Delft University of Technology, Kramers Laboratorium voor Fysische Technologie, Prins Bernhardlaan 6, 2628 BW Delft, The Netherlands
An overview is given of the novel developments and trends in Chemical Vapor Deposition process and equipment modeling over the last five years. The developments are illustrated with three recent examples of the modeling research in the authors' group : Turbulent flow phenomena in cold-wall CVD reactors, selectivity loss in tungsten LPCVD, and acetylene combustion diamond CVD. Validations against experimental data, e.g. in situ temperature and concentration measurements, are shown. The incorporation of CVD simulation models into commercial software packages is discussed.
© EDP Sciences 1999