J. Phys. IV France 7 (1997) C2-275-C2-276
Si-O-Si Angle Distribution in Amorphous Silica Characterized by EXAFS Multiple Scattering CalculationsA. Moen1, L. Le Noc1, D.T. On1, L. Bonneviot1, L. Lévesque2 and D. Roy2
1 Department of Chemistry, CERPIC, Laval University, Ste Foy, G1K 7P4, Québec, Canada
2 Department of Physics, CERPIC, Laval University, Ste Foy, G1K 7P4, Québec, Canada
EXAFS-Multiple Scattering (MS) calculations has been performed to characterize the second shell of neighbours around silicon in amorphous silica. To render the large Si-O-Si angle distribution, a combination of three regular [(Si(OSi)4] structural models covering the 130 to 160° angle range is used in the calculations.
© EDP Sciences 1997