J. Phys. IV France 05 (1995) C5-695-C5-698
The Study of the Boron Nitride Thin Layer StructureG.S. Yuryev, E.A. Maximovskiy, Yu.M. Rumyantsev, N.I. Fainer and M.L. Kosinova
Institute of Inorganic Chemistry, Siberian Branch of the Russian Academy of Sciences, 630090 Novosibirsk, Russia
The structure of thin layers of boron nitride obtained by low temperature plasma enhanced chemical vapour deposition of borazine as precursor has been investigated by X-ray diffraction method. The diffraction pattern consists of the superposition of the three patterns : from non-crystalline turbostrate am-BN, from polycrystalline h-BN and c-BN. The sizes of intermolecular (nucleus surrounded by "fringe"), 14.8 Å, and intramolecular (nucleus), 7.6 Å, formations are evaluated from the reflection positions in non-crystalline state and confirmed by calculation. Polycrystalline reflections from h-BN and c-BN are in accordance with known ones for these modifications.
© EDP Sciences 1995