J. Phys. IV France 05 (1995) C5-567-C5-582
Remote PECVD : a Route to Controllable Plasma DepositionS.E. Alexandrov
Department of Electronic Material Technology, St.-Petersburg State Technical University, Polytechnical Str. 29, St.-Petersburg 195 251, Russia
Some aspects of RF remote plasma enhanced CVD including the main features of the technique, possibilities of overcoming disadvantages typical for conventional plasma processes, and possible directions to improve the remote plasma method are discussed.
© EDP Sciences 1995