J. Phys. IV France 05 (1995) C5-509-C5-516
Deposition of MoO3 Films from a Volatile Molybdenyl ComplexB. Ballarin1, E. Brescacin2, G.A. Rizzi2 and E. Tondello2
1 Centro di Studi sulla Stabilità e Reattività dei Composti di Coordinazione del CNR, Dipartimento di Chimica Inorganica Metallorganica ed Analitica, Via Marzolo 1, Università di Padova, 35141 Padova, Italy
2 Nesmeyanov Institute of Organoelement Compounds, 28 Vavilov Str., 117813 Moscow, Russia
A volatile molybdenyl complex was used as precursor for MOCVD of MoO3 films. Decomposition paths were investigated by thermal analysis. Good quality films were obtained on different substrates and characterized by XPS, UV-Vis, XRD and SEM analyses. The different electronic properties of the various films on different substrates were studied by photoemission experiments and compared with respect to the MoO3 single crystal.
© EDP Sciences 1995