J. Phys. IV France
Volume 05, Numéro C5, Juin 1995
Proceedings of the Tenth European Conference on Chemical Vapour Deposition
Page(s) C5-465 - C5-472
Proceedings of the Tenth European Conference on Chemical Vapour Deposition

J. Phys. IV France 05 (1995) C5-465-C5-472

DOI: 10.1051/jphyscol:1995553

Nickel Thin Films Grown by MOCVD Using Ni(dmg)2 as Precursor

M. Becht1, J. Gallus2, M. Hunziker2, F. Atamny3 and K.-H. Dahmen4

1  Superconductivity Research Laboratory (SRL), 10-13 1-chome. Shinonome Koto-ku. Tokyo 135, Japan
2  Federal Institute of Technology, Department of Inorganic Chemistry, Universitätsstrasse 6, 8092 Zürich, Switzerland
3  Federal Institute of Technology, Department of Chemical Engineering and Industrial Chemistry, Universitätststr. 6, 8092 Zürich, Switzerland
4  The Florida State University, Department of Chemistry, Tallahassee, Florida 32306-3006, U.S.A.

The aim of this study was (i) to investigate alternatives to the very toxic Ni(CO)4, (ii) optimization of the parameters for Ni film growth, and (iii) characterization of the film morphology. The thermal behaviour of the precursors bis(dimethylglyoximato)Ni(II), [Ni(dmg)2], bis(2,2,6,6-tetramethyl-3,5-heptandionato)Ni(II), [Ni(thd)2], N,N'-ethylenebis(2,4-pentandioniminoato)Ni(II), [Ni(enacac)], and bis(2-amino-pent-2-en-4-onato)Ni(II), [Ni(apo)2] were investigated in a model reactor. Furthermore, the evaporation rates of these compounds were determined. Metallic nickel films were obtained using Ni(dmg)2 as precursor. The deposition was carried out in a horizontal quartz reactor at reduced pressure in a hydrogen/helium atmosphere. The films were analysed by profilometry, X-ray diffraction, atomic force microscopy (AFM), fourpoint resistivity measurements and electron spectroscopy for chemical analysis (ESCA). Comparison of the AFM and ESCA data with the electrical resistances resulted in a two layer film model.

© EDP Sciences 1995