8 ITMP3 / 8éme conférence internationale de photoacoustique et photothermique
J. Phys. IV France 04 (1994) C7-745-C7-748
Investigation of laser-induced damage at 248 nm in oxide thin films with a pulsed photoacoustic mirage techniqueJ. Siegel1, M. Reichling1, E. Matthias1, E. Hacker2 and H. Lauth2
1 Fachbereich Physik, Freie Universität Berlin, Arnimallee 14, 14195 Berlin, Germany
2 Dünnschichtzentrum, JENOPTIK GmbH, Curl-Zeiss-Strasse I, 07743 Jena, Germany
Laser damage thresholds at 248nm of TiO2, ZrO2 and HfO2 thin films of λ optical thickness on SQ1 quartz glass substrates are determined by the photoacoustic mirage technique. Damage thresholds correlate with the band gap energy of these materials, as determined by optical spectroscopy. It is demonstrated that the damage resistance can be raised by an additional λ/2 SiO2 overlayer. Damage thresholds are identical for polycrystalline and amorphous film structure and not influenced by a change of substrate material from quartz to BK7 glass.
© EDP Sciences 1994