Numéro
J. Phys. IV France
Volume 03, Numéro C8, Décembre 1993
IX International Conference on Small Angle Scattering
Page(s) C8-337 - C8-340
DOI http://dx.doi.org/10.1051/jp4:1993868
IX International Conference on Small Angle Scattering

J. Phys. IV France 03 (1993) C8-337-C8-340

DOI: 10.1051/jp4:1993868

X-ray reflectivity and non-specular scattering investigation of amorphous W/Si multilayers after rapid thermal annealing

M. JERGEL, E. MAJKOVÁ and S. LUBY

Institute of Physics, Slovak Academy of Sciences, Dúbravská cesta 9, 842 28 Bratislava, Slovakia


Abstract
The specular reflectivity and non-specular scattering measurements at grazing incidence were used to characterize the evolution of the amorphous W/Si multilayer structure with the nominal period of 7 nm after the rapid thermal annealing. No mixing or interdiffusion worsening the perfection of the interfaces takes place up to the 773K/5s annealing. The complex interface phenomena start after the 773K/20s annealing connected with the displacement and coarsening of the interfaces. After the 1023K/5s annealing the ML structure collapsed.



© EDP Sciences 1993