Numéro
J. Phys. IV France
Volume 03, Numéro C7, Novembre 1993
The 3rd European Conference on Advanced Materials and Processes
Troisiéme Conférence Européenne sur les Matériaux et les Procédés Avancés
Page(s) C7-2173 - C7-2176
DOI http://dx.doi.org/10.1051/jp4:19937346
The 3rd European Conference on Advanced Materials and Processes
Troisiéme Conférence Européenne sur les Matériaux et les Procédés Avancés

J. Phys. IV France 03 (1993) C7-2173-C7-2176

DOI: 10.1051/jp4:19937346

Characterization of thin films using generalized lamb wave dispersion relations

P. RICHARD, O. BEHREND, G. GREMAUD and A. KULIK

Ecole Polytechnique Fédérale de Lausanne, Département de Physique, Institut de Génie Atomique, 1015 Lausanne, Switzerland


Abstract
We used the Continuous Wave Scanning Acoustic Microscope to characterize thin film materials. The measurement of the dispersion curve of surface waves and the inversion of this dispersion equation relation, allow to determine the elastic constants, the density or the thickness of a thin layer on a substrate. Besides, it is possible to have qualitative information on the adhesion properties of the layer.



© EDP Sciences 1993