Numéro
J. Phys. IV France
Volume 03, Numéro C7, Novembre 1993
The 3rd European Conference on Advanced Materials and Processes
Troisiéme Conférence Européenne sur les Matériaux et les Procédés Avancés
Page(s) C7-2159 - C7-2163
DOI http://dx.doi.org/10.1051/jp4:19937343
The 3rd European Conference on Advanced Materials and Processes
Troisiéme Conférence Européenne sur les Matériaux et les Procédés Avancés

J. Phys. IV France 03 (1993) C7-2159-C7-2163

DOI: 10.1051/jp4:19937343

Nuclear analytical techniques and applications to materials processing

G. BLONDIAUX and J.L. DEBRUN

CNRS, CERI, 3a rue de la Férolerie, 45071 Orléans cedex 2, France


Abstract
This paper will present the application of Rutherford backscattering spectrometry to thin film steochiometry determination and application to optimization of the film process elaboration in the case of dielectric films (Ge,Pb,O) and ionic conductors films (Na,Al,O). After we shall present the application of particles induced gamma emisson (PIGE) for the characterization of ternary compounds (B,Si,C) used as coating to protect composites materials. The last part of this paper will describe the determination of oxygen in the bulk of fluoride glasses with charged particles activation analysis.



© EDP Sciences 1993