Numéro
J. Phys. IV France
Volume 03, Numéro C7, Novembre 1993
The 3rd European Conference on Advanced Materials and Processes
Troisiéme Conférence Européenne sur les Matériaux et les Procédés Avancés
Page(s) C7-1069 - C7-1072
DOI http://dx.doi.org/10.1051/jp4:19937167
The 3rd European Conference on Advanced Materials and Processes
Troisiéme Conférence Européenne sur les Matériaux et les Procédés Avancés

J. Phys. IV France 03 (1993) C7-1069-C7-1072

DOI: 10.1051/jp4:19937167

Stability and formation kinetics of TiN and silicides in the Ti/Si3N4 diffusion couple

M. PAULASTO1, F.J.J. VAN LOO2 and J.K. KIVILAHTI1

1  Helsinki University of Technology, Dept. of Materials Science and Technology, 02150 Espoo, Finland
2  On leave from Technical University of Eindhoven, Lab. of Solid State Chemistry and Materials Science, 5600 MB Eindhoven, The Netherlands


Abstract
Reactions in Ti/Si3N4 and TiN/Si diffusion couples annealed in the temperature range of 1000-1200°C were studied theoretically as well as experimentally with SEM/EPMA technique. Isothermal sections of the Ti-Si-N system were calculated using the most recent thermodynamic data. Calculations showed that TiN and Si react with each other and form Si3N4 and TiSi2, parallel to the experimental studies. Correspondingly, results from the Ti/Si3N4 couple were in good accordance with calculated phase equilibria.



© EDP Sciences 1993