Numéro
J. Phys. IV France
Volume 03, Numéro C7, Novembre 1993
The 3rd European Conference on Advanced Materials and Processes
Troisiéme Conférence Européenne sur les Matériaux et les Procédés Avancés
Page(s) C7-1003 - C7-1006
DOI http://dx.doi.org/10.1051/jp4:19937156
The 3rd European Conference on Advanced Materials and Processes
Troisiéme Conférence Européenne sur les Matériaux et les Procédés Avancés

J. Phys. IV France 03 (1993) C7-1003-C7-1006

DOI: 10.1051/jp4:19937156

Propriétés des couches de ZrO2 et de HfO2 obtenues par évaporation thermique réactive

F. TCHELIEBOU, A. BOYER and J.P. CHERON

Centre d'Electronique de Montpellier; Laboratoire associé au CNRS, URA 391, Université Montpellier II, Sciences et Techniques du Languedoc, Place Eugène Bataillon, 34095 Montpellier cedex 5, France


Abstract
Zirconia (ZrO2) and hafnia (HfO2) were obtained by reactive thermal evaporation with a high deposition rate. Films physical properties were investigated. The layers were deposited onto nickel and also onto NiCoCrAlY- nickel substrates. It was found that this plug layer enhances both oxide adherence and its dielectrical properties, yelding interesting electrical insulation. Elsewhere, X-rays patterns displayed polycrystalline structure. These ceramics were applied in thermal sensors and could be used as corrosion-resistant layers or coating materials.



© EDP Sciences 1993